3-D SRIM Simulation of Focused Ion Beam Sputtering with an Application-Oriented Incident Beam Model

Focused Ion Beam Lithography

Nanoimprint Mold Manufacturing with Focused Ion Beam

Nanoimprint lithography (NIL) is an emerging low cost technique for reproducing sub-45 nm pattern in various applications; however, manufacturing the mold for nanoimprint has been a key challenge in expense and resolution. Focused Ion Beams (FIB) has been known for high resolution but low throughput work in TEM sample preparation, and its extremely well defined 7 nm diameter Ga beam make it als...

Focused Ion Beam Milling of Semiconductors An imaging challenge

In recent years, the challenges confronting semiconductor engineers have increased exponentially. Not only are new semiconductors harder to design, but also harder to test and debug as a result of growing complexity, decreased feature size, and the introduction of new materials and manufacturing processes. Moreover, in today’s environment of continually shortening product life cycles, all of th...

Focused Ion Beam Microscopy and Micromachining

The FIB Instrument The basic functions of the FIB, namely, imaging and sputtering with an ion beam, require a highly focused beam. A consistent tenet of any focused beam is that the smaller the effective source size, the more current that can be focused to a point. Unlike the broad ion beams generated from plasma sources, high-resolution ion beams are defined by the use of a field ionization so...

Sculpting on polymers using focused ion beam

Available online 13 June 2008 It has been recently shown t